SEMIPROBE MEMS-0515 Wafer Probe Station Owners Manual

SEMIPROBE MEMS-0515 Wafer Probe Station

Introduction

A precise manual wafer probe station called the SEMIPROBE MEMS-0515 was created for electrically characterizing semiconductor devices, MEMS, and nanomaterials. Its high-accuracy positioning probes controlled by micromanipulators make it perfect for failure analysis, process development, and research labs in cleanroom or laboratory settings.

Specification

Chuck Size: Maximum
Wafer Capacity: 150 mm (6″) XY
Stage Travel (manual control): 100 mm × 100 mm Z-Axis
Range: 25 mm (focus adjustment for the microscope)
Probe Holders: manual manipulators with four to eight positions ±1μm is the contact accuracy (with precise adjustability)
Platen Material: Ceramic or ground stainless steel (ESD-safe alternatives)
Operating Conditions: non-condensing, 15–30°C, <60% relative humidity

Features

• Precision Micromanipulators: sub-micron positioning tungsten or gold-tipped probes
• Anti-Vibration Design: Isolated base minimizes ambient noise
• ESD-Safe Options: shielded cables for delicate devices and grounded chuck
• Modular Design: Suitable for probe card adapters, vacuum chucks, and thermal chucks
• Support for Multiple Microscopes: Camera integration and optional brightfield/darkfield illumination

Specific Requirements

The customer wanted to test 200 mm silicon MEMS wafers using a manual probe system integrated with a Polytec MSA-500 MEMS Motion Analyzer. The motion analyzer would measure a variety of MEMS devices while in-plane and out-of-plane. The wafer chuck would need to be tilted in a variety of directions. The devices would be contacted with a probe card as well as individual manipulators with coaxial probe arms and DCprobe needles.

SemiProbe Solution

• M-8 Manual 200 mm probe system:
  • 200 mm of X, Y, Z and theta stage
  • Rapid Align Stage provides both coarse and fine stage movement
  • Vibration isolation table
• Integrated with a Polytec MSA-500 motion analyzer
• 200 mm wafer chuck (non-thermal) with X and Y in-plane and out-of-plane adjustability for the MSA-500
• Compound microscope:
  • movement of 50 mm of X and Y
  • pneumatic microscope lift (MSA 500)
• Six manual three-axis manipulators with coaxial probe arms, cables and DC probes
• Probe card holder

Safety Information

• Electrical Hazard: Always use an ESD mat or wrist strap to release static before probing.
• Sharp Probes: Take caution when handling tungsten needles to prevent harm.
• Cleanroom Compliance: Adhere to the guidelines when using ISO Class 3–5 settings.
• Absence of solvents: Use only lint-free wipes and authorized electronics-grade IPA to clean.
• Weight Limit: The maximum load on the chuck surface is 5 kg.

Customer Support

276 East Allen Street Winooski, VT 05404, US – www.semiprobe.com

PDF

SEMIPROBE MEMS-0515 Wafer Probe Station Owners Manual

FAQs